Surface loss probabilities of the dominant neutral precursors for film growth 
in methane and acetylene discharges

Hopf, C.; Letourneur, K.; Jacob, W.; Schwarz-Selinger, T.; von Keudell, A.

doi:10.1063/1.124184

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Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges

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Hopf, C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger, T.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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von Keudell, A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf, C., Letourneur, K., Jacob, W., Schwarz-Selinger, T., & von Keudell, A. (1999). Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges. Applied Physics Letters, 74(25), 3800-3802. doi:10.1063/1.124184.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8546-A

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