Dependence of energy distributions of sputtered and reflected atoms on incident 
fluence

Eckstein, W.; Dohmen, R.; Friedrich, H.; Hertweck, F.

doi:10.1016/S0168-583X(98)01016-7

アイテム詳細

登録内容を編集ファイル形式で保存

一時保存へ追加

タグ情報を表示リリース履歴を表示詳細要約

公開

学術論文

Dependence of energy distributions of sputtered and reflected atoms on incident fluence

MPS-Authors

/persons/resource/persons109001

Eckstein, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons108958

Dohmen, R.
Computer Center Garching (RZG), Max Planck Institute for Plasma Physics, Max Planck Society;

External Resource

There are no locators available

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

フルテキスト (公開)

公開されているフルテキストはありません

付随資料 (公開)

There is no public supplementary material available

引用

Eckstein, W., Dohmen, R., Friedrich, H., & Hertweck, F. (1999). Dependence of energy distributions of sputtered and reflected atoms on incident fluence. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 153(1-4), 345-349. doi:10.1016/S0168-583X(98)01016-7.

引用: https://hdl.handle.net/11858/00-001M-0000-0027-8551-0

要旨

要旨はありません