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Chemical sputtering yields of carbon based materials at high ion flux densities

MPS-Authors
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Grote,  H.
W7-X: Construction, Max Planck Institute for Plasma Physics, Max Planck Society;

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Bohmeyer,  W.
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

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Kornejew,  P.
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

Reiner,  H. D.
Max Planck Society;

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Fussmann,  G.
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Grote, H., Bohmeyer, W., Kornejew, P., Reiner, H. D., Fussmann, G., Schlöogl, R., et al. (1999). Chemical sputtering yields of carbon based materials at high ion flux densities. Journal of Nuclear Materials, 266-269, 1059-1064. doi:10.1016/S0022-3115(98)00854-X.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-859A-E
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