Angular dependence of the sputtering yield of rough beryllium surfaces

Küstner, M.; Eckstein, W.; Hechtl, E.; Roth, J.

doi:10.1016/S0022-3115(98)00648-5

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Angular dependence of the sputtering yield of rough beryllium surfaces

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Eckstein, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Roth, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Küstner, M., Eckstein, W., Hechtl, E., & Roth, J. (1999). Angular dependence of the sputtering yield of rough beryllium surfaces. Journal of Nuclear Materials, 265(1-2), 22-27. doi:10.1016/S0022-3115(98)00648-5.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-85F9-9

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