Silicide formation by high-temperature reaction of Rh with model SiO2 films

Labich, S.; Kohl, A.; Taglauer, E.; Knözinger, H.

doi:10.1063/1.476784

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Silicide formation by high-temperature reaction of Rh with model SiO₂ films

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Kohl, A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Taglauer, E.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Labich, S., Kohl, A., Taglauer, E., & Knözinger, H. (1998). Silicide formation by high-temperature reaction of Rh with model SiO₂ films. Journal of Chemical Physics, 109(6), 2052-2055. doi:10.1063/1.476784.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8819-3

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