Hydrogen bonding in plasma-deposited amorphous hydrogenated boron films

Sass, M.; Annen, A.; Jacob, W.

doi:10.1063/1.365997

Item

ITEM ACTIONSEXPORT

Add to Basket

Local TagsRelease HistoryDetailsSummary

Released

Journal Article

Hydrogen bonding in plasma-deposited amorphous hydrogenated boron films

MPS-Authors

/persons/resource/persons108575

Annen, A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109489

Jacob, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

External Resource

No external resources are shared

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

Fulltext (public)

There are no public fulltexts stored in PuRe

Supplementary Material (public)

There is no public supplementary material available

Citation

Sass, M., Annen, A., & Jacob, W. (1997). Hydrogen bonding in plasma-deposited amorphous hydrogenated boron films. Journal of Applied Physics, 82(4), 1905-1908. doi:10.1063/1.365997.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-89AB-4

Abstract

There is no abstract available