Deposition and characterization of dense and stable amorphous hydrogenated 
boron films at low substrate temperatures

Annen, A.; Beckmann, R.; Jacob, W.

doi:10.1016/S0022-3093(96)00568-6

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Deposition and characterization of dense and stable amorphous hydrogenated boron films at low substrate temperatures

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Annen, A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

Beckmann, R.
Max Planck Society;

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Jacob, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Annen, A., Beckmann, R., & Jacob, W. (1997). Deposition and characterization of dense and stable amorphous hydrogenated boron films at low substrate temperatures. Journal of Non-Crystalline Solids, 209(3), 240-246. doi:10.1016/S0022-3093(96)00568-6.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8A4B-5

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