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Deposition and characterization of dense and stable amorphous hydrogenated boron films at low substrate temperatures

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Annen,  A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

Beckmann,  R.
Max Planck Society;

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Jacob,  W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Annen, A., Beckmann, R., & Jacob, W. (1997). Deposition and characterization of dense and stable amorphous hydrogenated boron films at low substrate temperatures. Journal of Non-Crystalline Solids, 209(3), 240-246. doi:10.1016/S0022-3093(96)00568-6.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-8A4B-5
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