Electron and hole doping in NiO

Reinert, F.; Steiner, P.; Hüfner, S.; Schmitt, H.; Fink, J.; Knupfer, M.; Sandl, P.; Bertel, E.

doi:10.1007/BF01317591

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Electron and hole doping in NiO

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Fink, J.
Experimental Plasma Physics 1 (E1), Max Planck Institute for Plasma Physics, Max Planck Society;

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Sandl, P.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Bertel, E.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Reinert, F., Steiner, P., Hüfner, S., Schmitt, H., Fink, J., Knupfer, M., et al. (1995). Electron and hole doping in NiO. Zeitschrift für Physik B: Condensed Matter, 97(1), 83-93. doi:10.1007/BF01317591.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8E00-D

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