The influence of boron doping on the structure and thermal decomposition of 
ultrathin C/B:H films

Schenk, A.; Winter, B.; Lutterloh, C.; Biener, J.; Schubert, U. A.; Küppers, J.

doi:10.1063/1.359185

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The influence of boron doping on the structure and thermal decomposition of ultrathin C/B:H films

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Schenk, A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Lutterloh, C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Biener, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

Schubert, U. A.
Max Planck Society;

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Küppers, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schenk, A., Winter, B., Lutterloh, C., Biener, J., Schubert, U. A., & Küppers, J. (1995). The influence of boron doping on the structure and thermal decomposition of ultrathin C/B:H films. Journal of Applied Physics, 77(11), 6006-6014. doi:10.1063/1.359185.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8EB1-1

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