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Sputtering of boron‐doped graphite USB15—Investigation of the origin of low chemical erosion

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Schwörer,  R.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Roth,  J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwörer, R., & Roth, J. (1995). Sputtering of boron‐doped graphite USB15—Investigation of the origin of low chemical erosion. Journal of Applied Physics, 77(8), 3812-3817. doi:10.1063/1.359560.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8ED1-A
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