Sputtering of boron‐doped graphite USB15—Investigation of the origin of low 
chemical erosion

Schwörer, R.; Roth, J.

doi:10.1063/1.359560

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Sputtering of boron‐doped graphite USB15—Investigation of the origin of low chemical erosion

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Schwörer, R.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Roth, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwörer, R., & Roth, J. (1995). Sputtering of boron‐doped graphite USB15—Investigation of the origin of low chemical erosion. Journal of Applied Physics, 77(8), 3812-3817. doi:10.1063/1.359560.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8ED1-A

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