Evaluation of silicon doped CFCs for plasma facing material

Wu, C. H.; Alessandrini, C.; Moormann, R.; Rubel, M.; Scherzer, B. M. U.

doi:10.1016/0022-3115(94)00598-2

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Evaluation of silicon doped CFCs for plasma facing material

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Scherzer, B. M. U.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Wu, C. H., Alessandrini, C., Moormann, R., Rubel, M., & Scherzer, B. M. U. (1995). Evaluation of silicon doped CFCs for plasma facing material. Journal of Nuclear Materials, 220-222, 860-864. doi:10.1016/0022-3115(94)00598-2.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8EE5-D

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