Role of hydrogen ions in plasma‐enhanced chemical vapor deposition of 
hydrocarbon films, investigated by in situ ellipsometry

Keudell, A. von; Jacob, W.; Fukarek, W.

doi:10.1063/1.113229

Item

ITEM ACTIONSEXPORT

Add to Basket

Local TagsRelease HistoryDetailsSummary

Released

Journal Article

Role of hydrogen ions in plasma‐enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry

MPS-Authors

/persons/resource/persons109597

Keudell, A. von
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109489

Jacob, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

External Resource

No external resources are shared

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

Fulltext (public)

There are no public fulltexts stored in PuRe

Supplementary Material (public)

There is no public supplementary material available

Citation

Keudell, A. v., Jacob, W., & Fukarek, W. (1995). Role of hydrogen ions in plasma‐enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry. Applied Physics Letters, 66(11), 1322-1324. doi:10.1063/1.113229.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8F21-C

Abstract

There is no abstract available