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H atom impact induced chemical erosion reaction at C:H film surfaces

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Horn,  A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schenk,  A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Biener,  J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Lutterloh,  C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Wittmann,  M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Küppers,  J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Horn, A., Schenk, A., Biener, J., Winter, B., Lutterloh, C., Wittmann, M., et al. (1994). H atom impact induced chemical erosion reaction at C:H film surfaces. Chemical Physics Letters, 231(2-3), 193-198. doi:10.1016/0009-2614(94)01233-4.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-9001-D
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