H atom impact induced chemical erosion reaction at C:H film surfaces

Horn, A.; Schenk, A.; Biener, J.; Winter, B.; Lutterloh, C.; Wittmann, M.; Küppers, J.

doi:10.1016/0009-2614(94)01233-4

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H atom impact induced chemical erosion reaction at C:H film surfaces

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Horn, A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schenk, A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Biener, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Lutterloh, C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Wittmann, M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Küppers, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Horn, A., Schenk, A., Biener, J., Winter, B., Lutterloh, C., Wittmann, M., et al. (1994). H atom impact induced chemical erosion reaction at C:H film surfaces. Chemical Physics Letters, 231(2-3), 193-198. doi:10.1016/0009-2614(94)01233-4.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-9001-D

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