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A combined plasma‐surface model for the deposition of C:H films from a methane plasma

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Keudell,  A. von
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Möller,  W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Keudell, A. v., & Möller, W. (1994). A combined plasma‐surface model for the deposition of C:H films from a methane plasma. Journal of Applied Physics, 75(12), 7718-7727. doi:10.1063/1.356603.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-9079-1
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