Application of dynamic in situ ellipsometry to the deposition of tin‐doped 
indium oxide films by reactive direct‐current magnetron sputtering

Fukarek, W.; Kersten, H.

doi:10.1116/1.579162

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Application of dynamic in situ ellipsometry to the deposition of tin‐doped indium oxide films by reactive direct‐current magnetron sputtering

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Fukarek, W.
Max Planck Society;

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Fukarek, W., & Kersten, H. (1994). Application of dynamic in situ ellipsometry to the deposition of tin‐doped indium oxide films by reactive direct‐current magnetron sputtering. Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films, 12(2), 523-528. doi:10.1116/1.579162.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-90A9-4

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