Substrate diffusion in metastable ultrathin films: Iron on Cu(001)

Detzel, T.; Memmel, N.

doi:10.1103/PhysRevB.49.5599

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Substrate diffusion in metastable ultrathin films: Iron on Cu(001)

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Detzel, T.
Infineon Technologies Austria AG, A-9500 Villach, Austria;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Memmel, N.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Detzel, T., & Memmel, N. (1994). Substrate diffusion in metastable ultrathin films: Iron on Cu(001). Physical Review B, 49(8), 5599-5606. doi:10.1103/PhysRevB.49.5599.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-90CD-3

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