Influence of energy reflected from the target on thin film characteristics

Winters, H. F.; Coufal, H. J.; Eckstein, W.

doi:10.1116/1.578787

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Influence of energy reflected from the target on thin film characteristics

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Eckstein, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Winters, H. F., Coufal, H. J., & Eckstein, W. (1993). Influence of energy reflected from the target on thin film characteristics. Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films, 11(3), 657-663. doi:10.1116/1.578787.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-92A0-6

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