Sputter-Induced Concentration Profiles in Binary-Alloys

Van Wyk, G. N.; Roos, W. D.; Duplessis, J.; Taglauer, E.

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Sputter-Induced Concentration Profiles in Binary-Alloys

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Taglauer, E.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Van Wyk, G. N., Roos, W. D., Duplessis, J., & Taglauer, E. (1993). Sputter-Induced Concentration Profiles in Binary-Alloys. Institute of Physics Conference Series, (130), 435-438.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-931B-E

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