Low energy helium implantation in evaporated nickel surfaces

Nygren, R. E.; Doyle, B. L.; Walsh, D. S.; Ottenberger, W.; Brooks, J. N.; Krauss, A.

doi:10.1016/S0022-3115(06)80098-X

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Low energy helium implantation in evaporated nickel surfaces

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Doyle, B. L.
Max Planck Institute for Plasma Physics, Max Planck Society;

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Ottenberger, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Nygren, R. E., Doyle, B. L., Walsh, D. S., Ottenberger, W., Brooks, J. N., & Krauss, A. (1992). Low energy helium implantation in evaporated nickel surfaces. Journal of Nuclear Materials, 196-198, 558-563. doi:10.1016/S0022-3115(06)80098-X.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-947E-4

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