English
 
User Manual Privacy Policy Disclaimer Contact us
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Mechanism of chemical erosion of sputter‐deposited C:H films

MPS-Authors
/persons/resource/persons110348

Schenk,  A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons108703

Biener,  J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110806

Winter,  B.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109855

Lutterloh,  C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

Schubert,  U. A.
Max Planck Society;

/persons/resource/persons109728

Küppers,  J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

Locator
There are no locators available
Fulltext (public)
There are no public fulltexts available
Supplementary Material (public)
There is no public supplementary material available
Citation

Schenk, A., Biener, J., Winter, B., Lutterloh, C., Schubert, U. A., & Küppers, J. (1992). Mechanism of chemical erosion of sputter‐deposited C:H films. Applied Physics Letters, 61(20), 2414-2416. doi:10.1063/1.108182.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-948E-F
Abstract
There is no abstract available