Formation of a modulated void structure in heavy-ion-irradiated amorphous 
silicon

Fratzl, P.; Klaumünzer, S; Rammensee, M; Vogl, G

doi:10.1209/0295-5075/11/6/011

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Formation of a modulated void structure in heavy-ion-irradiated amorphous silicon

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Fratzl, P., Klaumünzer, S., Rammensee, M., & Vogl, G. (1990). Formation of a modulated void structure in heavy-ion-irradiated amorphous silicon. Europhysics Letters, 11(6), 547-553. doi:10.1209/0295-5075/11/6/011.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-31D3-9

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