Observation of phonon confinement in SiGe nanocrystals and preferential etching 
of Si in porous Si1-xGex films

Kartopu, G.; Bayliss, S. C.; Ekinci, Y.; Parker, E. H. C.; Naylor, T.

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Observation of phonon confinement in SiGe nanocrystals and preferential etching of Si in porous Si_1-xGe_x films

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Ekinci, Y.
Emeritus Group Molecular Interactions, Max Planck Institute for Dynamics and Self-Organization, Max Planck Society;

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Kartopu, G., Bayliss, S. C., Ekinci, Y., Parker, E. H. C., & Naylor, T. (2003). Observation of phonon confinement in SiGe nanocrystals and preferential etching of Si in porous Si_1-xGe_x films. Physica Status Solidi A-Applied Research, 197(1), 263-268.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0029-16E5-C

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