English
 
User Manual Privacy Policy Disclaimer Contact us
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Obstacle strength of binary junction due to dislocation dipole formation: An in-situ transmission electron microscopy study

MPS-Authors
/persons/resource/persons125164

Haghighat,  Seyed Masood Hafez
Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Ecole Polytechnique Fédérale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas, Association Euratom-Confédération Suisse, Villigen PSI, Switzerland;

Locator
There are no locators available
Fulltext (public)
There are no public fulltexts available
Supplementary Material (public)
There is no public supplementary material available
Citation

Haghighat, S. M. H., & Schäublin, R. E. (2015). Obstacle strength of binary junction due to dislocation dipole formation: An in-situ transmission electron microscopy study. Journal of Nuclear Materials, 465, 648-652. doi:10.1016/j.jnucmat.2015.06.054.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0028-35B9-9
Abstract
There is no abstract available