Obstacle strength of binary junction due to dislocation dipole formation: An 
in-situ transmission electron microscopy study

Haghighat, Seyed Masood Hafez; Schäublin, Robin E.

doi:10.1016/j.jnucmat.2015.06.054

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Obstacle strength of binary junction due to dislocation dipole formation: An in-situ transmission electron microscopy study

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Haghighat, Seyed Masood Hafez
Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Ecole Polytechnique Fédérale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas, Association Euratom-Confédération Suisse, Villigen PSI, Switzerland;

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Haghighat, S. M. H., & Schäublin, R. E. (2015). Obstacle strength of binary junction due to dislocation dipole formation: An in-situ transmission electron microscopy study. Journal of Nuclear Materials, 465, 648-652. doi:10.1016/j.jnucmat.2015.06.054.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-35B9-9

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