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Nanofabrication of optical elements for SXR and EUV applicatins: ion beam lithography as a new approach

MPS-Authors
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Lenz,  J.
Electron Microscopy and Analytics, Center of Advanced European Studies and Research (caesar), Max Planck Society;

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Krupp,  N.
Electron Microscopy and Analytics, Center of Advanced European Studies and Research (caesar), Max Planck Society;

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Irsen,  S.
Electron Microscopy and Analytics, Center of Advanced European Studies and Research (caesar), Max Planck Society;

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Citation

Lenz, J., Krupp, N., Wilhein, T., & Irsen, S. (2011). Nanofabrication of optical elements for SXR and EUV applicatins: ion beam lithography as a new approach. In 10th Interantional Conference on X-Ray Microscopy (pp. 104-107).


Cite as: http://hdl.handle.net/11858/00-001M-0000-0028-60DC-2
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