Physical and Chemical Sputtering of Graphite and SiC by Hydrogen and Helium in 
the Energy Range of 600_keV to 7500_keV

Roth, J.; Bohdansky, J.; Poschenrieder, W.; Sinha, M.K.

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Physical and Chemical Sputtering of Graphite and SiC by Hydrogen and Helium in the Energy Range of 600_keV to 7500_keV

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Roth, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Bohdansky, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Poschenrieder, W.
Experimental Plasma Physics 3 (E3), Max Planck Institute for Plasma Physics, Max Planck Society;

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Roth, J., Bohdansky, J., Poschenrieder, W., & Sinha, M. (1976). Physical and Chemical Sputtering of Graphite and SiC by Hydrogen and Helium in the Energy Range of 600_keV to 7500_keV. Journal of Nuclear Materials, 63, 222-229.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-B8A4-6

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