Depth Profiling of Implanted exp.3_He in Solids by Nuclear Reaction and 
Rutherford Backscattering

Roth, J.; Meyer, O.; Behrisch, R.; Eckstein, W.; Scherzer, B.M.U.

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Depth Profiling of Implanted exp.3_He in Solids by Nuclear Reaction and Rutherford Backscattering

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Roth, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Behrisch, R.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Eckstein, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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引用

Roth, J., Meyer, O., Behrisch, R., Eckstein, W., & Scherzer, B. (1976). Depth Profiling of Implanted exp.3_He in Solids by Nuclear Reaction and Rutherford Backscattering. In Ion Beam Surface Layer Analysis (pp. 47-54).

引用: https://hdl.handle.net/11858/00-001M-0000-0028-B8AC-5

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