Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient 
Effects in the Altered Layer

Baretzky, B.; Kiriakidis, G.; Taglauer, E.

Item

ITEM ACTIONSEXPORT

Add to Basket

Local TagsRelease HistoryDetailsSummary

Released

Book Chapter

Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient Effects in the Altered Layer

MPS-Authors

/persons/resource/persons110618

Taglauer, E.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

External Resource

No external resources are shared

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

Fulltext (public)

There are no public fulltexts stored in PuRe

Supplementary Material (public)

There is no public supplementary material available

Citation

Baretzky, B., Kiriakidis, G., & Taglauer, E. (1986). Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient Effects in the Altered Layer. In Erosion and Growth of Solids Stimulated by Atom and Ion Beams (pp. 146-150). Nijhoff.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-BAD5-A

Abstract

There is no abstract available