Epitaxial Regrowth of Ne-Implanted and Kr-Implanted Amorphous Silicon

Wittmer, M.; Roth, J.; Revesz, P.; Mayer, J.W.

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Epitaxial Regrowth of Ne-Implanted and Kr-Implanted Amorphous Silicon

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Roth, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Wittmer, M., Roth, J., Revesz, P., & Mayer, J. (1978). Epitaxial Regrowth of Ne-Implanted and Kr-Implanted Amorphous Silicon. Journal of Applied Physics, 49, 10, 5207-5212.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-BC1B-7

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