Reactive and Non-Reactive High Rate Sputter Deposition of Tungsten Carbide

Fuchs, K.; Bertel, E.; Roedhammer, H.; Netzer, F.P.; Gornick, E.

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Reactive and Non-Reactive High Rate Sputter Deposition of Tungsten Carbide

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Bertel, E.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Fuchs, K., Bertel, E., Roedhammer, H., Netzer, F., & Gornick, E. (1987). Reactive and Non-Reactive High Rate Sputter Deposition of Tungsten Carbide. Thin Solid Films, 151, 383-395.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-BF9B-F

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