The Possible Contribution of SiH_sub.2 and SiH_sub.3 in the Plasma-Induced 
Deposition of Amorphous Silicon from Silane

Veprek, S.; Veprek-Heijman, M.G.J.

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The Possible Contribution of SiH_sub.2 and SiH_sub.3 in the Plasma-Induced Deposition of Amorphous Silicon from Silane

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Veprek, S., & Veprek-Heijman, M. (1990). The Possible Contribution of SiH_sub.2 and SiH_sub.3 in the Plasma-Induced Deposition of Amorphous Silicon from Silane. Appl. Phys. Lett., 56, 1766-1768.

引用: https://hdl.handle.net/11858/00-001M-0000-0028-C51E-F

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