Physical Sputtering of Low-Z Materials

Gauthier, E.; Eckstein, W.; Laszlo, J.; Roth, J.

doi:10.1016/0022-3115(90)90086-3

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Physical Sputtering of Low-Z Materials

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Gauthier, E.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Eckstein, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Laszlo, J.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Roth, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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http://dx.doi.org/10.1016/0022-3115(90)90086-3
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Gauthier, E., Eckstein, W., Laszlo, J., & Roth, J. (1990). Physical Sputtering of Low-Z Materials. Journal of Nuclear Materials, 176-177, 438-444. doi:10.1016/0022-3115(90)90086-3.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-C6A2-A

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