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Journal Article

Stability of Plasma Deposited Amorphous Hydrogenated Boron Films

MPS-Authors
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Annen,  A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob,  W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Annen, A., Sass, M., Beckmann, R., & Jacob, W. (1997). Stability of Plasma Deposited Amorphous Hydrogenated Boron Films. Thin Solid Films, 300, 101-106.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0028-CF03-6
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