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ECR Plasmas for Thin-Film Depostition

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Wilhelm,  R.
Technology (TE), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Wilhelm, R., Schlueter, H., & Shivarova, A. (1999). ECR Plasmas for Thin-Film Depostition. In Advanced Technologies Based on Wave and Beam Generated Plasmas (pp. 111-122). Kluwer Academic Publ.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-D2C1-3
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