Study on the Atomic and Electronic Structure in CrN (VN, TiN) Films using Cs
-Corrected TEM

Zhang, Zaoli; Dehm, Gerhard

doi:10.1017/S1431927615011174

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Study on the Atomic and Electronic Structure in CrN (VN, TiN) Films using C_s-Corrected TEM

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Dehm, Gerhard
Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Zhang, Z., & Dehm, G. (2015). Study on the Atomic and Electronic Structure in CrN (VN, TiN) Films using C_s-Corrected TEM. Microscopy and Microanalysis, 21(3), 2079-2080. doi:10.1017/S1431927615011174.

Cite as: http://hdl.handle.net/11858/00-001M-0000-0028-E693-A

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