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学術論文

Ultra-thin silicate films on metals

MPS-Authors
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Shaikhutdinov,  Shamil K.
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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フルテキスト (公開)

Silica review J Cond Matt final.pdf
(全文テキスト(全般)), 2MB

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引用

Shaikhutdinov, S. K., & Freund, H.-J. (2015). Ultra-thin silicate films on metals. Journal of Physics: Condensed Matter, 27(44):. doi:10.1088/0953-8984/27/44/443001.


引用: https://hdl.handle.net/11858/00-001M-0000-0029-35DD-8
要旨
Silica is one of the key materials in many modern technological applications. 'Surface science' approach for understanding surface chemistry on silica-based materials, on the one hand, and further miniaturization of new generation electronic devices, on the other, all these face the necessity of rational design of the ultrathin silica films on electrically conductive substrates. The review updates recent studies in this field. Despite the structural complexity and diversity of silica, substantial progress has recently been achieved in understanding of the atomic structure of truly 2D silicates.