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Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications

MPS-Authors
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Jeong,  H.-H.
Max Planck Research Group Micro, Nano, and Molecular Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mark,  A. G.
Max Planck Research Group Micro, Nano, and Molecular Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Lee,  T.-C.
Max Planck Research Group Micro, Nano, and Molecular Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institute for Materials Discovery, University College London;

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Son,  K.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Chen,  W.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Department of Biophysical Chemistry, University of Heidelberg;

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Alarcón-Correa,  M.
Max Planck Research Group Micro, Nano, and Molecular Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institute of Physical Chemistry, University of Stuttgart;

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Kim,  I.
Max Planck Research Group Micro, Nano, and Molecular Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institute of Physical Chemistry, University of Stuttgart;

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Schütz,  G.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Fischer,  P.
Max Planck Research Group Micro, Nano, and Molecular Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institute of Physical Chemistry, University of Stuttgart;

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Citation

Jeong, H.-H., Mark, A. G., Lee, T.-C., Son, K., Chen, W., Alarcón-Correa, M., et al. (2015). Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications. Advanced Science, 2(2): 1500016. doi:10.1002/advs.201500016.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0029-BF2A-2
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