Doped Oxides and the Oxide-Metal Interfaces: Reactivity at the Molecular Level

Freund, Hans-Joachim

Item

ITEM ACTIONSEXPORT

Add to Basket

Local TagsRelease HistoryDetailsSummary

Released

Talk

Doped Oxides and the Oxide-Metal Interfaces: Reactivity at the Molecular Level

MPS-Authors

/persons/resource/persons21524

Freund, Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

External Resource

No external resources are shared

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

Fulltext (public)

There are no public fulltexts stored in PuRe

Supplementary Material (public)

There is no public supplementary material available

Citation

Freund, H.-J. (2016). Doped Oxides and the Oxide-Metal Interfaces: Reactivity at the Molecular Level. Talk presented at 10th International Workshop on Oxide Surfaces (IWOX-X). Dalian, Liaoyang, China. 2016-01-10 - 2016-01-15.

Cite as: https://hdl.handle.net/11858/00-001M-0000-002A-0918-3

Abstract

There is no abstract available