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Journal Article

Growth condition dependence of unintentional oxygen incorporation in epitaxial GaN


Wirth,  Steffen
Steffen Wirth, Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Schubert, F., Wirth, S., Zimmermann, F., Heitmann, J., Mikolajick, T., & Schmult, S. (2016). Growth condition dependence of unintentional oxygen incorporation in epitaxial GaN. Science and Technology of Advanced Materials, 17(1), 239-243. doi:10.1080/14686996.2016.1178565.

Cite as: https://hdl.handle.net/11858/00-001M-0000-002A-F6BA-0
Growth conditions have a tremendous impact on the unintentional background impurity concentration in gallium nitride (GaN) synthesized by molecular beam epitaxy and its resulting chemical and physical properties. In particular for oxygen identified as the dominant background impurity we demonstrate that under optimized growth stoichiometry the growth temperature is the key parameter to control its incorporation and that an increase by 55 degrees C leads to an oxygen reduction by one order of magnitude. Quantitatively this reduction and the resulting optical and electrical properties are analyzed by secondary ion mass spectroscopy, photoluminescence, capacitance versus voltage measurements, low temperature magneto-transport and parasitic current paths in lateral transistor test structures based on two-dimensional electron gases. At a growth temperature of 665 degrees C the residual charge carrier concentration is decreased to below 10(15) cm(-3), resulting in insulating behavior and thus making the material suitable for beyond state-of-the-art device applications.