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Thermal re-emission model

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Chattopadhyay,  A. K.
Max Planck Institute for the Physics of Complex Systems, Max Planck Society;

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Chattopadhyay, A. K. (2002). Thermal re-emission model. Physical Review B, 65(4): 041405. Retrieved from http://ojps.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=PRBMDO000065000004041405000001&idtype=cvips&gifs=yes.


Cite as: http://hdl.handle.net/11858/00-001M-0000-002B-3834-2
Abstract
Starting from a continuum description, We study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like alphaapproximate tozapproximate to1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly. Galilean invariance is maintained throughout.