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Analysis of power deposition and temperature rise due to presence of an implant inside a 1.5 t MRI RF coil

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Kozlov,  Mikhail
MR:comp GmbH, Gelsenkirchen, Germany;
Department Neurophysics (Weiskopf), MPI for Human Cognitive and Brain Sciences, Max Planck Society;

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Citation

Kozlov, M., & Schaefers, G. (2015). Analysis of power deposition and temperature rise due to presence of an implant inside a 1.5 t MRI RF coil. In 37th Annual International Conference of the IEEE Engineering in Medicine and Biology Society (EMBC) (pp. 5797-5800). Piscataway: IEEE. doi:10.1109/EMBC.2015.7319709.


Cite as: http://hdl.handle.net/11858/00-001M-0000-002B-41EE-6
Abstract
We numerically investigated power deposition and temperature rise generated due to the presence of a titanium rod placed in a phantom, located inside a 1.5 T coil. The induced power deposition and temperature rise normalized to incident tangential electric field was found to be dependent on distance to the phantom wall. The different dependence of the integral of power deposition over a box surrounded the rod and the temperature rise on American Society for Testing and Materials (ASTM) phantom medium electrical conductivity was observed. The consequences of numerical domain simplification have been analyzed.