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Journal Article

The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition

MPS-Authors
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Hoeflich,  Katja
Micro- & Nanostructuring, Technology Development and Service Units, Max Planck Institute for the Science of Light, Max Planck Society;

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Leuchs,  Gerd
Leuchs Division, Max Planck Institute for the Science of Light, Max Planck Society;

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Christiansen,  Silke
Christiansen Research Group, Research Groups, Max Planck Institute for the Science of Light, Max Planck Society;
Micro- & Nanostructuring, Technology Development and Service Units, Max Planck Institute for the Science of Light, Max Planck Society;

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Citation

Hoeflich, K., Yang, R. B., Berger, A., Leuchs, G., & Christiansen, S. (2011). The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition. SI, 23(22-23), 2657-+. doi:10.1002/adma.201004114.


Cite as: https://hdl.handle.net/11858/00-001M-0000-002D-69C9-A
Abstract
Various nanostructures are directly written by electron-beam-induced deposition using dimethyl-gold(III)-acetylacetonate as the precursor gas. After purification, their potential applications include plasmonic devices and metamaterials. Carbon contamination of the as-written structures can be completely removed by low-temperature ozone treatment, leaving polycrystalline pure gold structures (see figure). This treatment reduces the size of the nanostructures but does not substantially alter their functional shape.