4% Conversion of Sub-mu J Near-IR Pulses to Deep UV in Fundamental Mode of 
Ar-filled PCF

Hoelzer, P.; Nold, J.; Joly, N. Y.; Wong, K. L. G.; Scharrer, M.; Stark, S. P.; Chang, W.; Podlipensky, A.; Russell, P. St. J.

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Conference Paper

4% Conversion of Sub-mu J Near-IR Pulses to Deep UV in Fundamental Mode of Ar-filled PCF

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/persons/resource/persons201088

Hoelzer, P.
Russell Division, Max Planck Institute for the Science of Light, Max Planck Society;

/persons/resource/persons201141

Nold, J.
Russell Division, Max Planck Institute for the Science of Light, Max Planck Society;

/persons/resource/persons201100

Joly, N. Y.
Russell Division, Max Planck Institute for the Science of Light, Max Planck Society;

/persons/resource/persons201235

Wong, K. L. G.
Russell Division, Max Planck Institute for the Science of Light, Max Planck Society;

/persons/resource/persons201178

Scharrer, M.
Russell Division, Max Planck Institute for the Science of Light, Max Planck Society;

/persons/resource/persons201202

Stark, S. P.
Russell Division, Max Planck Institute for the Science of Light, Max Planck Society;

/persons/resource/persons201032

Chang, W.
Russell Division, Max Planck Institute for the Science of Light, Max Planck Society;

/persons/resource/persons201159

Podlipensky, A.
Russell Division, Max Planck Institute for the Science of Light, Max Planck Society;

/persons/resource/persons201171

Russell, P. St. J.
Russell Division, Max Planck Institute for the Science of Light, Max Planck Society;

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Citation

Hoelzer, P., Nold, J., Joly, N. Y., Wong, K. L. G., Scharrer, M., Stark, S. P., et al. (2010). 4% Conversion of Sub-mu J Near-IR Pulses to Deep UV in Fundamental Mode of Ar-filled PCF. In 2010 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (QELS). 345 E 47TH ST, NEW YORK, NY 10017 USA: IEEE.

Cite as: https://hdl.handle.net/11858/00-001M-0000-002D-6B4B-7

Abstract

We report extreme self-compression of sub-mu J 30 fs pulses at 800 nm in Ar-filled hollow-core PCF, resulting in 4% conversion to deep UV light in the fundamental guided mode, pressure-tunable from 220-270 nm. (C)2010 Optical Society of America