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Journal Article

Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications

MPS-Authors
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Chen,  Wenwen
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;

/persons/resource/persons75462

Fischer,  Peer       
Max Planck Institute for Medical Research, Max Planck Society;

External Resource

http://onlinelibrary.wiley.com/doi/10.1002/advs.201500016/epdf
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https://dx.doi.org/10.1002/advs.201500016
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Citation

Jeong, H.-H., Mark, A. G., Lee, T.-C., Son, K., Chen, W., Alarcón-Correa, M., et al. (2015). Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications. Advanced Science, 2(7): 1500016, pp. 1-7. doi:10.1002/advs.201500016.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0029-BF2A-2
Abstract
A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.