Tunable UV laser photolysis of organometallics with product detection by laser 
mass spectroscopy: Trimethylaluminum.

Beuermann, T.; Stuke, M.

doi:10.1007/BF00332274

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Tunable UV laser photolysis of organometallics with product detection by laser mass spectroscopy: Trimethylaluminum.

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Beuermann, T.
Abteilung Laserphysik, MPI for biophysical chemistry, Max Planck Society;

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Stuke, M.
Research Group of Laser Chemical Processing, MPI for biophysical chemistry, Max Planck Society;

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Citation

Beuermann, T., & Stuke, M. (1989). Tunable UV laser photolysis of organometallics with product detection by laser mass spectroscopy: Trimethylaluminum. Applied Physics B, 49(2), 145-148. doi:10.1007/BF00332274.

Cite as: https://hdl.handle.net/11858/00-001M-0000-002C-39B6-5

Abstract

We use tunable UV laser light in the region 200–320 nm, produced by frequency doubling the output of a dye laser, for the decomposition of organometallic compounds. This method has been applied to TMA, trimethylaluminum Al(CH3)3. Only the TMA monomer absorbs UV light for λ >220 nm. TMA decomposes by one-photon absorption mainly into two channels: aluminum atoms Al plus organic fragments, and aluminummonomethyl AlCH3 molecules plus organic fragments. The ratio [Al]/[AlCH3] is wavelength dependent. We present a mechanism to explain the photolysis of trimethyl compounds of group III elements (Al, Ga, In).