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Micro-nanostructured interfaces fabricated by the use of inorganic block copolymer micellar monolayers as negative resist for electron beam lithography

MPS-Authors
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Glass,  Roman
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;

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Arnold,  Marco
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;

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Blümmel,  Jacques
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;

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Spatz,  Joachim P.
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;
Biophysical Chemistry, Institute of Physical Chemistry, University of Heidelberg, 69120 Heidelberg, Germany;

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Citation

Glass, R., Arnold, M., Blümmel, J., Küller, A., Möller, M., & Spatz, J. P. (2003). Micro-nanostructured interfaces fabricated by the use of inorganic block copolymer micellar monolayers as negative resist for electron beam lithography. Advanced Functional Materials, 13(7), 569-575. doi:10.1002/adfm.200304331.


Cite as: http://hdl.handle.net/11858/00-001M-0000-002A-22C1-C
Abstract
This paper introduces an approach where the match of two different length scales, i.e., pattern from self-assembly of block copolymer micelles (< 100 nm) and electron-beam (e-beam) writing (> 50 nm), allow the grouping of nanometer-sized gold clusters in very small numbers in even aperiodic pattern and separation of these groups at length scales that are not accessible by pure self-assembly. Thus, we could demonstrate the grouping of Au nanoclusters in different geometries such as squares, rings, or spheres.