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Reactive ion etching of cylindrical polyferrocenylsilane block copolymer micelles: fabrication of ceramic nanolines on semiconducting substrates

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Spatz,  Joachim P.
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;
Biophysical Chemistry, Institute of Physical Chemistry, University of Heidelberg, 69120 Heidelberg, Germany;

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Citation

Cao, L., Massey, J. A., Winnik, M. A., Manners, I., Riethmüller, S., Banhart, F., et al. (2003). Reactive ion etching of cylindrical polyferrocenylsilane block copolymer micelles: fabrication of ceramic nanolines on semiconducting substrates. Advanced Functional Materials, 13(4), 271-276. doi:10.1002/adfm.200304261.


Cite as: https://hdl.handle.net/11858/00-001M-0000-002A-1579-8
Abstract
The diblock copolymers, poly(isoprene-block-ferrocenyldimethylsilane) (PI-b-PFDMS) and poly(ferrocenyldimethylsilane-block-dimethylsiloxane) (PFDMS-b-PDMS), form cylindrical micelles with an organometallic polyferrocenylsilane core in a solvent of hexanes. These cylindrical micelles were deposited onto a Si substrate from solution by either spin or dip coating, and upon reactive ion etching, continuous ceramic nanolines with lengths of micrometers and widths as small as 8 nm were created. The nanolines were characterized by scanning force microscopy (SFM) and transmission electron microscopy (TEM), and were shown to contain Fe, Si, and O from X-ray photoelectron spectroscopy (XPS) studies. The widths of the nanolines could be varied from ca. 8 to 30 nm, depending on the composition of the corona (PI or PDMS). The oriented deposition of these cylindrical micelles can be achieved along pre-patterned grooves on a resist film using capillary forces. Following treatment with hydrogen or oxygen plasma, oriented ceramic nanolines can be fabricated. The approach reported here represents a relatively simple method to create ceramic nanolines with large aspect ratio on semiconducting substrates.