Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser 
pulses.

Küper, S.; Stuke, M.

doi:10.1063/1.100831

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Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser pulses.

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Küper, S.
Abteilung Laserphysik, MPI for biophysical chemistry, Max Planck Society;

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Stuke, M.
Abteilung Laserphysik, MPI for biophysical chemistry, Max Planck Society;

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Citation

Küper, S., & Stuke, M. (1989). Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser pulses. Applied Physics Letters, 54(1), 4-6. doi:10.1063/1.100831.

Cite as: https://hdl.handle.net/11858/00-001M-0000-002C-6404-F

Abstract

Experiments on the ablation of undoped polytetrafluoroethylene (Teflon) with 300 fs UV excimer laser pulses at 248 nm are reported for the first time. In contrast to standard excimer laser pulses, these ultrashort pulses ablate Teflon with good edge quality and no signs of thermal damage for fluences down to 0.5 J/cm2 with removal rates on the order of 1 μm per pulse.