On the structural development during ultrathin amorphous Al2O3 film growth on 
Al(111) and Al(100) surfaces by thermal oxidation

Flötotto, David; Wang, Zumin; Mittemeijer, Eric Jan

doi:10.1016/j.susc.2014.11.008

アイテム詳細

登録内容を編集ファイル形式で保存

一時保存へ追加

タグ情報を表示リリース履歴を表示詳細要約

公開

学術論文

On the structural development during ultrathin amorphous Al₂O₃ film growth on Al(111) and Al(100) surfaces by thermal oxidation

MPS-Authors

/persons/resource/persons81276

Flötotto, David
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

/persons/resource/persons76262

Wang, Zumin
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

/persons/resource/persons75858

Mittemeijer, Eric Jan
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institut für Materialwissenschaft, Universität Stuttgart, Heisenbergstraße 3, 70569 Stuttgart, Germany;

External Resource

There are no locators available

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

フルテキスト (公開)

公開されているフルテキストはありません

付随資料 (公開)

There is no public supplementary material available

引用

Flötotto, D., Wang, Z., & Mittemeijer, E. J. (2015). On the structural development during ultrathin amorphous Al₂O₃ film growth on Al(111) and Al(100) surfaces by thermal oxidation. Surface Science, 633, 1-7. doi:10.1016/j.susc.2014.11.008.

引用: https://hdl.handle.net/11858/00-001M-0000-002C-AA74-B

要旨

要旨はありません