On the structural development during ultrathin amorphous Al2O3 film growth on 
Al(111) and Al(100) surfaces by thermal oxidation

Flötotto, David; Wang, Zumin; Mittemeijer, Eric Jan

doi:10.1016/j.susc.2014.11.008

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On the structural development during ultrathin amorphous Al₂O₃ film growth on Al(111) and Al(100) surfaces by thermal oxidation

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Flötotto, David
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Wang, Zumin
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer, Eric Jan
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institut für Materialwissenschaft, Universität Stuttgart, Heisenbergstraße 3, 70569 Stuttgart, Germany;

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Flötotto, D., Wang, Z., & Mittemeijer, E. J. (2015). On the structural development during ultrathin amorphous Al₂O₃ film growth on Al(111) and Al(100) surfaces by thermal oxidation. Surface Science, 633, 1-7. doi:10.1016/j.susc.2014.11.008.

Cite as: https://hdl.handle.net/11858/00-001M-0000-002C-AA74-B

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