Microstructure and intrinsic stress evolution during epitaxial film growth of 
an Ag0.93Al0.07 solid solution on Si(111); excessive planar faulting due to 
quantum confinement

Flötotto, David; Wang, Z. M.; Markel, Ingo; Kurz, Silke; Mittemeijer, Eric Jan

doi:10.1063/1.4964945

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Microstructure and intrinsic stress evolution during epitaxial film growth of an Ag0.93Al0.07 solid solution on Si(111); excessive planar faulting due to quantum confinement

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Flötotto, David
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Markel, Ingo
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

/persons/resource/persons75744

Kurz, Silke
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer, Eric Jan
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institut für Materialwissenschaft, Universität Stuttgart, Heisenbergstraße 3, 70569 Stuttgart, Germany;

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引用

Flötotto, D., Wang, Z. M., Markel, I., Kurz, S., & Mittemeijer, E. J. (2016). Microstructure and intrinsic stress evolution during epitaxial film growth of an Ag0.93Al0.07 solid solution on Si(111); excessive planar faulting due to quantum confinement. Journal of Applied Crystallography, 120(15):. doi:10.1063/1.4964945.

引用: https://hdl.handle.net/11858/00-001M-0000-002D-1BF6-8

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